link

・Symp. E9: "ULSI Process Integration 7",
220th Meeting of the Electrochem. Soc.
Oct. 10-13, 2011
Boston, USA

・7th Int. Conf. on Silicon Epitaxy and Heterostructures
(ICSI-7)
Aug. 28 - Sep. 2, 2011
Leuven, Belgium (Rescheduled)

・3rd Int. Conf. on Semiconductor Technology for
Ultra Large Scale Integrated Circuits and Thin Film Transistors
(ULSIC vs. TFT)
June 26 - July 1, 2011
Hong Kong, China

・Int. Conf. on Solid-State and Integrated Circuit Technology
(ICSICT-2010)
Nov. 1-4, 2010
Shanghai, China

・4th SiGe, Ge, and Related Compounds:
Materials, Processing, and Devices Symp.,
218th Meeting of the Electrochem. Soc.
Oct. 10-15, 2010
Las Vegas, Nevada, USA

・Int. Symp. on Technology Evolution for Silicon Nano-Electronics
(ISTESNE)
Jun. 3-5, 2010
Tokyo, Japan

・5th Int. SiGe Technology and Device Meeting
(ISTDM2010)
May 24-26, 2010
Stockholm, Sweden

・5th Int. Workshop on New Group IV Semiconductor Nanoelectronics
(RIEC Int. Symp.)
Jan. 28-30, 2010
Tohoku Univ., Sendai, JAPAN

・Symp. E10: "ULSI Process Integration 6",
216th Meeting of the Electrochem. Soc.
Oct. 4-9, 2009
Vienna, Austria

・1st Int. Workshop on Si based nano-electronics and -photonics
(SiNEP-09)
Sep. 20-23, 2009
Univ. Vigo, Spain

・2nd Int. Conf. on Semiconductor Technology for
Ultra Large Scale Integrated Circuits and Thin Film Transistors
(ULSIC vs. TFT)
July 5-10, 2009
Xi'an, China

・6th Int. Conf. on Silicon Epitaxy and Heterostructures
(ICSI-6)
May 17-22, 2009
Los Angeles, USA

・Symp. Z: “Material Science and Process Technologies for Advanced Nano-Electronic Devices", Int. Union of Materials Research Society
- Int. Conf. in Asia 2008 (IUMRS-ICA 2008)
Dec. 9-13, 2008
Nagoya, Japan

・3rd ECS Int. SiGe & Ge Symp
Oct. 12-17, 2008,
Hawaii, USA

・4th Int. Workshop on New Group IV Semiconductor Nanoelectronics
Sep. 25-27, 2008
Tohoku Univ., Sendai, JAPAN

・4th Int. SiGe Technology and Device Meeting (ISTDM2008)
May 11-14, 2008
Hsinchu, Taiwan

・3rd Int. WorkShop on New Group IV Semiconductor Nanoelectronics
November 8(Thu.) - 9(Fri.), 2007
Laboratory for Nanoelectronics and Spintronics Research Institute of Electrical Communication Tohoku University, SENDAI, JAPAN

・5th Int. Symp. on Control of Semiconductor Interfaces
November 12(Mon.)-14(Wed.), 2007
Tokyo Metropolitan University, Hachioji, Tokyo, Japan

・Symp. E9: "ULSI Process Integration 5",
212th Meeting of the Electrochem. Soc.
Oct. 7-12, 2007
Washington, DC, USA

・5th Int. Conf. on Silicon Epitaxy and Heterostructures
May 20(Sat.)-24(Thu.), 2007, Marseille, France

・2006 Joint Int. Meeting, 210th Meeting of The Electrochemical Society, Inc. SiGe & Ge Materials, Processing, and Devices Symposium
October 29(Sat)-November 3(Fri), 2006, Moon Palace Resort, Cancun, Mexico

・2nd Int. Workshop on New Group IV Semiconductor Nanoelectronics
Oct. 2(Mon.) - 3(Tue.), 2006, Tohoku University, Sendai, Japan

・3rd Int. SiGe Technology and Device Meeting
(ISTDM2006)
May 15(Mon)-17(Wed), 2006, Princeton University, New Jersey, USA

・The E-MRS 2006 Spring Meeting Symposium L : Characterization of High-K Dielectric Materials
May 29(Mon)-June 2(Fri), 2006, Nice, France

・1st Int. Workshop on New Group IV Semiconductor Nanoelectronics
May 27(Fri)-28(Sat), 2005, Tohoku University, Sendai, Japan

・Silicon Epitaxy and Heterostructures ICSI-4 (Fourth Int. Conf.) Homepage
May 23(Mon)-26(Thu), 2005, Awaji Island, Hyogo, Japan

・Third Int. SiGe(C) Workshop Homepage
October 12(Tue)-13(Wed), 2004, Laboratory for Nanoelectronics and Spintronics Research Institute of Electrical Communication Tohoku University, Sendai, Japan

・SiGe Materials Processing and Device (The Electrochemical Society 206th Meeting) Homepage
October 3(Sun)-8(Fri), 2004, Honolulu, Hawaii, USA