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Atomically Controlled Processing
Laboratory for Nanoelectronics and Spintronics
Research Institute of Electrical Communication
Tohoku University

Conference Information
7th Int. Conf. on Silicon Epitaxy and Heterostructures

Leuven, Belgium, Aug. 28 - Sep. 1, 2011

6th Int. Symp. on Control of Semiconductor Interfaces

has been cancelled due to the current
difficult situation in Japan.


T. Kawashima received "Best Poster Award":
7th International Conference on Si Epitaxy and Heterostructures (ICSI-7)).

Murota Lab was introduced in RIEC News 2011 No.1iPDF 18Mbytes only in Japanesej

North-East Japan Earthquake:
All members of Murota Lab are safe.

Murota Lab Alumni Association Meeting has been held
at Sendai on July 24 (Sat) 17:30-20:00

Prof. Junichi Murota was awarded
"The Commendation for Science and Technology
by the Minister of Education, Culture, Sports, Science and
Technology for 2010: The Prizes for Science and Technology
in Research Category" for his works of
"Study on Atomically Controlled CVD Processing of
Group IV Semiconductors for Ultralarge Scale Integration"
(only in Japanese)

[ Diploma ]@@ [ Medal ]

Prof. J. Murota announced
"Excellence Initiative for New Group IV Semiconductor
Material & Processing (EI4GroupIV)".

A. Uto received "The Tohoku Chapter Encouragement Prize"
of The Japan Society of Applied Physics (JSPS).

Prof. J. Murota received
3rd "Jpn. Soc. Appl. Phys. (JSAP) Fellow"
for his works of
"Development of Atomically Controlled Processing
by Hetero CVD Technology for Group IV Semiconductors"

K. Sugawara and T. Kawashima received "MRS-J: Award for
Encouragement of Research in Materials Science
(The IUMRS Int. Conf. in Asia 2008 (IUMRS-ICA 2008))"

25 Jahre IHP - 25 Jahre Innovation
(25th Anniversary Ceremony of IHP) Presentation:
"Erfolgreiche Internationale Zusammenarbeit
(Successful International Collaboration)"
by Prof. Junichi Murota

Invited Review Paper: J. Murota et al., JJAP 45(9A), 2006

Prof. J. Murota received 3rd "Yamazaki-Teiichi Prize"
(Semiconductor & Semiconductor Devices Division)
for his works of
"Development of Group IV Hetero CVD Technology and
Creation of Atomically Controlled Processing"

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