Link to
"8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8)
and
6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI)"		 　 Link to "JSPS Core-to-Core Program : ICRC-ACP4ULSI"


JSPS Core-to Core Program Seminar
"Atomically Controlled Processing for Ultralarge Scale Integration"

Centennial Hall,
School of Medicine , Kyushu University, Fukuoka, Japan

　
　 　

Technical Program



　 　 　
　

June 6 (Thursday)



　 　 　
　 09:10 - 09:15
　 　C1-1. Opening
　 　
　 　 　

Abstract
↓

[ Session C1 ]
　 　 　
　

09:15 - 09:45 (30 min)

PDF

 C1-2. " Oxidation of Germanium - What is different from Oxidation of Silicon ? -",
　 　 (Invited)
Akira Toriumi,
Univ. Tokyo (Japan)
　 　 　
　 09:45 - 10:15 (30 min)

PDF

C1-3. "

 High Quality Ge Gate Stacks Technologies by Using Plasma Oxidation",
　 　 (Invited)
Shinichi Takagi, Rui Zhang and Mitsuru Takenaka,
Univ. Tokyo (Japan)
　 　 　
　 10:15 - 10:45 (30 min)
PDF C1-4. "

Formation and Characterization of Hybrid Nanodots Floating Gate for Optoelectronic Devices",
　 　 (Invited)
Seiichi Miyazaki 1), Katsunori Makihara 1) and Mitsuhisa Ikeda 2),
1) Nagoya Univ. (Japan), 2) Hiroshima Univ. (Japan)　
　 　 　
　

10:45 - 11:15 (30 min)
PDF C1-5. " Comparing Photoluminescence Measurements with Theoretical Predictions for Transition Energies in Ge Quantum Dot Structures",


(Invited)
Inga A. Fischer 1), Filipe Oliveira 1), Erlend Rolseth 1), Olaf Kirfel 1), Petru Tighineanu 2), Kurt Busch 3), Matthias Paul 1), Michael Jetter 1), Peter Michler 1), and Jorg Schulze 1),
 1) Univ. Stuttgart (Germany), 2) Univ. Copenhagen (Denmark), 3) Humboldt-Universität zu Berlin, Institut für Physik, AG Theoretische Optik & Photonik, and Max-Born-Institut (Germany), 




11:15 - 11:45 Break (30 min)






Abstract
↓		 [ Session C2 ]




11:45 - 12:15 (30 min)
PDF C2-1. " High Quality Ge Grown on Si for Photonics Device Integration into BiCMOS",


(Invited)
Y. Yamamoto 1), P. Zaumseil 1), S. Lischke 1), D. Knoll 1), L. Zimmermann 1), J. Murota 2) and B. Tillack 1,3),
1) IHP (Germany), 2) Tohoku Univ. (Japan), 3) TU. Berlin (Germany)




12:15 - 12:45 (30 min)
PDF C2-2. " Atomically Controlled Processing of Group IV Semiconductors by CVD for Ultralarge Scale Integration",


(Invited)
J. Murota 1), M. Sakuraba 1), B. Tillack 2,3),
1) Tohoku Univ. (Japan), 2) IHP (Germany), 3) TU Berlin (Germany)




12:45 - 14:15 Lunch Break (90 min)



　 　 　

Abstract
↓

[ Session C3 ]

　 　
　 14:15 - 14:45 (30 min)
PDF C3-1. " The effect of carbon on the magnetic properties of MnGe and Mn segregation",
　 　 (Invited)
V. Le Thanh, A. Spiesser, M.T. Dau, L.A. Michez, M. Petit,
Aix-Marseille Univ.  (France)
　 　 　
　 14:45 - 15:15 (30 min)
PDF C3-2. " Dopant diffusion and activation in Excimer laser annealed Group IV semiconductors",
　 　 (Invited)
S. Stefanov 1), F. Gontad 1), J.C. Conde 1), C. Serra 1), A. Benedetti 1), G.V. Luong  2), S. Wirths 2), U. Breuer 2), P. Alpuim 3), D. Buca 2), S. Chiussi 1),
1) Univ. Vigo (Spain), 2) Forschungszentrum Juelich (Germany), 3) Univ. Minho (Portugal)
　 　 　
　 15:15 - 15:30 (15 min)






Abstract
↓

[ Session C4 ]

　 　 　
　 15:30 - 16:00 (30 min)

PDF

C4-1. "

 Potential of GeSn and GeSiSn for Future Nanoelectronic Device Applications",
　 　 (Invited)
Shigeaki Zaima 1), Osamu Nakatsuka 1), Noriyuki Taoka 1), Takanori Asano 1), Takashi Yamaha 1), Masashi Kurosawa 2), Mitsuo Sakashita 1),
1) Nagoya University (Japan), 2) JSPS Research Fellow (Japan)



　16:00 - 16:30 (30 min)
PDF C4-2. " Oxygen in Si Epitaxial Growth: from Interface Contamination to Si/O Superlattice Engineering",


(Invited)
M. Caymax, S. Jayachandran, Lu Augustin, A. Delabie, R. Loo, A. Hikavyy, G. Pourtois, W. Vandervorst, M. Heyns,
imec (Belgium)



　16:30 - 16:50 (20 min)
PDF C4-3. " MBE growth of tensile-strained and n-doped Ge/Si heterosctructures using decomposition of GaP",


(Invited)
T.K.P. Luong 1), A. Ghrib 1), M.T. Dau 1), M.A. Zrir 1), V. Le Thanh 1), M. Petit 1), M. El Kurdi 2), P. Boucaud 2), J. Murota 3)
1) Aix-Marseille University (France), 2) University of Paris-Sud 11 (France), 3) Tohoku University (Japan)







16:50 - 16:55 Closing



　 　 　

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